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Analysis of interface layers by spectroscopic ellipsometry

Kim, T. J. et al.

Applied surface science.; Formation of semiconductor interfaces; ICFSI-11 /; Manaus, Brazil, 2007; Aug, 2008, 640-642 -- Elsevier; 2008 (pages 640-642) -- 2008

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Low dimensional silicon structures for photonic and sensor applications

Adamo, R. et al.

Applied surface science.; Formation of semiconductor interfaces; ICFSI-11 /; Manaus, Brazil, 2007; Aug, 2008, 624-627 -- Elsevier; 2008 (pages 624-627) -- 2008

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Semiconductor nanocrystals obtained by colloidal chemistry for biological applications

Santos, B. S. et al.

Applied surface science.; Formation of semiconductor interfaces; ICFSI-11 /; Manaus, Brazil, 2007; Aug, 2008, 796-798 -- Elsevier; 2008 (pages 796-798) -- 2008

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Effect of gas residence time on the morphology of silicon surface etched in SF6 plasmas

Pessoa, R. S. et al.

Applied surface science.; Formation of semiconductor interfaces; ICFSI-11 /; Manaus, Brazil, 2007; Aug, 2008, 749-751 -- Elsevier; 2008 (pages 749-751) -- 2008

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The effect of additional Si and SiGe layers on the confinement potential of GeMn diluted ferromagnetic semiconductor

Rodrigues, S. C. et al.

Applied surface science.; Formation of semiconductor interfaces; ICFSI-11 /; Manaus, Brazil, 2007; Aug, 2008, 709-711 -- Elsevier; 2008 (pages 709-711) -- 2008

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Interconnection effects on the performance of basic subcircuits with single-electron tunneling devices

Carneiro, V. G.; Guimaraes, J. G.; da Costa, J. C.

Applied surface science.; Formation of semiconductor interfaces; ICFSI-11 /; Manaus, Brazil, 2007; Aug, 2008, 715-717 -- Elsevier; 2008 (pages 715-717) -- 2008

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Metal ion induced room temperature phase transformation and stimulated infrared spectroscopy on TiO2-based surfaces

Gole, J. L.; Prokes, S. M.; White, M. G.

Applied surface science.; Formation of semiconductor interfaces; ICFSI-11 /; Manaus, Brazil, 2007; Aug, 2008, 718-721 -- Elsevier; 2008 (pages 718-721) -- 2008

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Characterization of surface states by SPV-transient

Sinkkonen, J.; Novikov, S.; Varpula, A.

Applied surface science.; Formation of semiconductor interfaces; ICFSI-11 /; Manaus, Brazil, 2007; Aug, 2008, 662-664 -- Elsevier; 2008 (pages 662-664) -- 2008

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Real-time monitoring of InAs QD growth procedure on InP substrate by spectral reflectance

Ahn, E. et al.

Applied surface science.; Formation of semiconductor interfaces; ICFSI-11 /; Manaus, Brazil, 2007; Aug, 2008, 656-658 -- Elsevier; 2008 (pages 656-658) -- 2008

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11th International conference on the formation of semiconductor interfaces : ICFSI-11 / guest editors: Eronides F. da Silva and Walter M. da Azevedo.

Elsevier, 2008.

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