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High-k Gate Stack Engineering Toward Meeting Low Standby Power and High Performance Targets

De Gendt, S.

Meeting abstracts / Electrochemical Society; Electrochemical Society; Quebec City, Canada, 2005; May, 2005, 619 -- Pennington, N.J.:; Electrochemical Society,; c2005 -- 2005

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Structures, Properties and Applications of Functional Thin Films by ALD

Choy, K.; de Gendt, S.

ECS transactions.; Atomic layer deposition; Vienna, Austria, 2009; Oct, 2009, 59-66 -- Pennington, N.J.; Electrochemical Society; c2009 (pages 59-66) -- 2009

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ALD Applications Beyond Outside IC Technology - Existing and Emerging Possibilities

Putkonen, M.I.; de Gendt, S.

ECS transactions.; Atomic layer deposition; Vienna, Austria, 2009; Oct, 2009, 143-156 -- Pennington, N.J.; Electrochemical Society; c2009 (pages 143-156) -- 2009

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A Study of Nanoparticle Removal On Patterned Surfaces

Pacco, A.; Holsteyns, F.; De Gendt, S.

Meeting abstracts / Electrochemical Society.; Electrochemical Society; 224th ECS Meeting Abstracts 2013; San Francisco, CA, 2013; Nov, 2013, 2096 -- Pennington, NJ; Electrochemical Society; [2013] Part 224; -- 2013

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A novel resist and post-etch residue removal process using ozonated chemistry

De Gendt, S.; Wauters, J.; Heyns, M.

Solid state technology. VOL 41; NUMBER 12, ; 1998, 57-62 -- SOLID STATE TECHNOLOGY (pages 57-62) -- 1998

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Formation of Cd~xZn~1~-~xS Films for Photovoltaic Buffer Layers by Atomic Layer Deposition

Bakke, J.R.; Bent, S.F.; de Gendt, S.

ECS transactions.; Atomic layer deposition; Vienna, Austria, 2009; Oct, 2009, 9-14 -- Pennington, N.J.; Electrochemical Society; c2009 (pages 9-14) -- 2009

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Liquid Injection Atomic Layer Deposition of Metallic Ru Thin Films from Ru(tmhd)~3 and of High-k TiO~2 Thin Films from Ti(O-i-Pr)~2(tmhd)~2

Kim, S. et al.

ECS transactions.; Atomic layer deposition; Vienna, Austria, 2009; Oct, 2009, 289-300 -- Pennington, N.J.; Electrochemical Society; c2009 (pages 289-300) -- 2009

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Equivalent Oxide Thickness Reduction for High- kappa Gate Stacks by Optimized Rare-Earth Silicate Reactions

Van Elshocht, S. et al.

Electrochemical and solid-state letters. VOL 12; NUMB 5, ; 2009, G17-G19 -- ELECTROCHEMICAL SOCIETY AND INSTITUTE OF ELECTRONICS ENGINEERS (pages G17-G19) -- 2009

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Organic contamination: impact, characterization, sources and cleaning during IC manufacturing

Claes, M. De Gendt, S.; Kolbesen, B. O.

Proceedings / Electrochemical Society PV.; Crystalline defects and contamination: their impact and control in device manufacturing; Erlagen, Germany, 2001; Sep, 2001, 320-335 -- Electrochemical Society; 2001 (pages 320-335) -- 2001

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A Study of Nanoparticle Removal on Patterned Surfaces

Pacco, A. et al.

ECS transactions.; Semiconductor cleaning science and technology; Semiconductor cleaning science and technology 13 (SCST 13); editors: T. Hattori [and three others]; San Francisco, CA, 2013; Oct, 2013, 17-24 -- Pennington, N.J.; Electrochemical Society; [2013] Part 6; (pages 17-24) -- 2013

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by this Author/Contributor:

  1. De Gendt, S
  2. Heyns, M
  3. Groeseneken, G.
  4. Conard, T.
  5. Van Elshocht, S.

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