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Chem. Vap. Deposition (7–8–9/2014)

Chemical vapor deposition: CVD. Volume 20:Issue 7/9 (2014, September); pp 312-312 -- Wiley-VCH Verlag

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Cover image from S. Şentürk Lüle and co‐workers (Chem. Vap. Deposition 2015, 21, 122)

Chemical vapor deposition: CVD. Volume 21:Issue 4/6 (2015, June); pp n/a-n/a -- Wiley-VCH Verlag

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Chem. Vap. Deposition (7–8–9/2013)

Chemical vapor deposition: CVD. Volume 19:Issue 7/9 (2013, September); pp 221-223 -- Wiley-VCH Verlag

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Chem. Vap. Deposition (10–11–12/2015)

Chemical vapor deposition: CVD. Volume 21:Issue 10/12 (2015); pp 334-334 -- Wiley-VCH Verlag

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Hardware Design Optimization and Process Control for a Low Friction Coefficient Substrate and Film: A Case Study in the Semiconductor Industry1

Fumagalli, Francesco et al.

Chemical vapor deposition: CVD. Volume 20:Issue 4/6 (2014, June); pp 177-180 -- Wiley-VCH Verlag

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Organic‐Inorganic Hybrid Nano‐laminates Fabricated by Ozone‐assisted Molecular‐atomic Layer Deposition1

Huang, Jie et al.

Chemical vapor deposition: CVD. Volume 19:Issue 4/6 (2013, June); pp 142-148 -- Wiley-VCH Verlag

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Parametric Study of Methane Catalytic CVD into Single‐walled Carbon Nanotubes Using Spin‐coated Iron Nanoparticles1

Seah, Choon‐Ming et al.

Chemical vapor deposition: CVD. Volume 19:Issue 1/3 (2013, March); pp 53-60 -- Wiley-VCH Verlag

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Cover image from A. M. Zhu and co‐workers (Chem. Vap. Deposition 2014, 20, 8)

Chemical vapor deposition: CVD. Volume 20:Issue 1/3 (2014); pp n/a-n/a -- Wiley-VCH Verlag

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Cover image from S. Şentürk Lüle and co‐workers (Chem. Vap. Deposition 2015, 21, 122)

Chemical vapor deposition: CVD. Volume 21:Issue 4/6 (2015, June); pp n/a-n/a -- Wiley-VCH Verlag

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A Novel Manganese(II) MOCVD Precursor: Synthesis, Characterization, and Mass Transport Properties of Mn(hfa)2tmeda1

Lipani, Zaira et al.

Chemical vapor deposition: CVD. Volume 19:Issue 1/3 (2013, March); pp 22-28 -- Wiley-VCH Verlag

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