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New ArF resist introduction for process through-put enhancement [6519-141]

Kim, M.-S. et al.

Proceedings of SPIE, the International Society for Optical Engineering.; Advances in resist materials and processing technology; San Jose, CA, 2007; Feb, 2007, 65193G -- Bellingham, Wash.; SPIE; c2007 -- 2007

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The study of defect control and patterning performance for top coating free resist process [6923-69]

Kim, M.-S. et al.

Proceedings of SPIE, the International Society for Optical Engineering.; Advances in resist materials and processing technology XXV; San Jose, CA, 2008; Feb, 2007, 6923 1T -- Bellingham, Wash.; SPIE; c2008 -- 2007

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  1. Park, S. N.  (1)
  2. Hong, S.-M.  (1)
  3. Jung, H. R.  (1)
  4. Shim, K.-C.  (1)
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by this Author/Contributor:

  1. Kim, M. S.
  2. Kim, H. J.
  3. Gil, M. G.
  4. Lee, H. G.
  5. Kang, H. S.

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