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Surface Preparation Techniques for the Atomic Layer Deposition of Hafnium Oxide

Conard, T. et al.

Materials Research Society symposia proceedings.; Gate stack scaling: materials, role of interfaces and reliability implications; San Francisco, Calif., 2006; Apr, 2006, 143-148 -- Materials Research Society; 2006 Part: Part; (pages 143-148) -- 2006

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by this Author/Contributor:

  1. Heyns, M.
  2. Deweerd, W.
  3. Vinckier, C.
  4. De Gendt, S.
  5. Delabie, A.

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