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Refined by: author: Kim, H. B. remove subject: Lithography remove
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Optical performance enhancement technique for 45-nm node with binary mask [6607-53]

Jung, J.-S. et al.

Proceedings of SPIE, the International Society for Optical Engineering.; Photomask and next-generation lithography mask technology; Yokohama, Japan, 2007; Apr, 2007, 66071I -- Bellingham, Wash.; SPIE; c2007 -- 2007

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by this Author/Contributor:

  1. Lee, J.‐W.
  2. Woo, S.-G.
  3. Jung, J.-S.
  4. Cho, H. K.
  5. Kim, H.-B.

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