skip to main content
Show Results with:

Results 1 - 10 of 76  for Everything in this catalogue

results 1 2 3 4 5 next page
Refined by: subject: Dry process remove
Result Number Material Type Add to My Shelf Action Record Details and Options
1
Material Type:
Article
Add to My workspace

Dry Etching of Magnesium Oxide Thin Films by Using Inductively Coupled Plasma for Buffer Layer of MFIS Structure

Kim, G. H.; Kim, C. I.

Proceedings of International Symposium on Dry Process.; Proceedings of 5th international symposium on dry process (27th since 1979); Jeju, Korea, 2005; Nov, 2005, 293-294 -- Institute of Electrical Engineers of Japan; 2005 (pages 293-294) -- 2005

Check library holdings

2
Material Type:
Article
Add to My workspace

Methodology for In-situ Chamber Condition Monitoring

Kim, G. H.; Kim, C. I.

Proceedings of International Symposium on Dry Process.; International symposium on dry process; DPS 2006; Nagoya, Japan, 2006; Nov, 2006, 205-206 -- Institute of Electrical Engineers of Japan,; 2006 Part: Part 6; (pages 205-206) -- 2006

Check library holdings

3
Material Type:
Article
Add to My workspace

Methodology for In-situ Chamber Condition Monitoring

Kim, G. H.; Kim, C. I.

Proceedings of International Symposium on Dry Process.; Dry process: DPS 2006; Nagoya, Japan, 2006; Nov, 2006, 205-206 -- Institute of Electrical Engineers of Japan; 2006 Part: Part 6; (pages 205-206) -- 2006

Check library holdings

4
Material Type:
Article
Add to My workspace

Etching Characteristics and Mechanisms for SrBi~2Ta~2O~9(SBT), Pb(Zr,Ti)O~3(PZT) and (Ba,Sr)TiO~3(BST) Thin Films in Cl~2/Ar Inductively Coupled Plasma

Efremov, A.; Kim, G. H.; Kim, C. I.

Proceedings of International Symposium on Dry Process.; Proceedings of 5th international symposium on dry process (27th since 1979); Jeju, Korea, 2005; Nov, 2005, 63-64 -- Institute of Electrical Engineers of Japan; 2005 (pages 63-64) -- 2005

Check library holdings

5
Material Type:
Article
Add to My workspace

Dry etching of magnesium oxide thin films by using inductively coupled plasma for buffer layer of MFIS structure

Kim, G. H.; Kim, C. I.

Thin solid films.; International symposium on dry process; Jeju, Korea, 2005; Nov, 2007, 4955-4959 -- Elsevier; 2007 (pages 4955-4959) -- 2007

Online access

6
Material Type:
Article
Add to My workspace

Ion Species Analysis with Quadrupole Mass Spectrometry in Ar/Cl~2 Inductively Coupled Plasma for the Estimation of Etching Mechanism

Kim, J. G. et al.

Proceedings of International Symposium on Dry Process.; Proceedings of 5th international symposium on dry process (27th since 1979); Jeju, Korea, 2005; Nov, 2005, 105-106 -- Institute of Electrical Engineers of Japan; 2005 (pages 105-106) -- 2005

Check library holdings

7
Material Type:
Article
Add to My workspace

Etching Characteristic Evaluation of Bi~4~-~xLa~xTi~3O~1~2 Thin Films with Various Gas Mixtures in the Inductively Coupled Plasma Sources

Kim, J. G. et al.

Proceedings of International Symposium on Dry Process.; International symposium on dry process; DPS 2006; Nagoya, Japan, 2006; Nov, 2006, 271-272 -- Institute of Electrical Engineers of Japan,; 2006 Part: Part 6; (pages 271-272) -- 2006

Check library holdings

8
Material Type:
Article
Add to My workspace

Etching Characteristic Evaluation of Bi~4~-~xLa~xTi~3O~1~2 Thin Films with Various Gas Mixtures in the Inductively Coupled Plasma Sources

Kim, J. G. et al.

Proceedings of International Symposium on Dry Process.; Dry process: DPS 2006; Nagoya, Japan, 2006; Nov, 2006, 271-272 -- Institute of Electrical Engineers of Japan; 2006 Part: Part 6; (pages 271-272) -- 2006

Check library holdings

9
Material Type:
Article
Add to My workspace

The Etching Properties of Na~0~.~5K~0~.~5NbO~3 Thin Films in Cl~2/Ar Gas Chemistry

Kang, C. M. et al.

Proceedings of International Symposium on Dry Process.; Dry process: DPS 2006; Nagoya, Japan, 2006; Nov, 2006, 119-120 -- Institute of Electrical Engineers of Japan; 2006 Part: Part 6; (pages 119-120) -- 2006

Check library holdings

10
Material Type:
Article
Add to My workspace

Etch Characteristics of ZrO~2 Thin Films in High Density Plasma (5 pages)

Woo, J.-C. et al.

Japanese journal of applied physics.; Dry process; , 2008, 2009, 08HD03 -- Japan Society of Applied Physics; 2009 Part 8; -- 2009

Check library holdings

Results 1 - 10 of 76  for Everything in this catalogue

results 1 2 3 4 5 next page

Refine Search Results

Refine my results

Access Options 

  1. Request to Reading Room  (63)
  2. Online: Reading Room only  (13)
  3. Refine further open sub menu

Creation date 

From To
  1. Before2002  (1)
  2. 2002To2002  (1)
  3. 2003To2003  (1)
  4. 2004To2005  (14)
  5. After 2005  (52)
  6. Refine further open sub menu

Try a new search

Ignore my search and look for everything

by this Author/Contributor:

  1. Kim, G. H.
  2. Kim, C. I.
  3. Yeom, G.-Y.
  4. Lee, N.-E.
  5. Lee, Y. H.

Searching Remote Databases, Please Wait