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Delamination of thin Si layer in the H^+ implanted SI for the manufacture of SOI Si wafer - fundamental phenomena and the properties of the delaminated Si layers (invited)

Hara, T.; Zhang, M.; Tu, K.-M.

INTERNATIONAL CONFERENCE ON SOLID STATE AND INTEGRATED CIRCUIT TECHNOLOGY.; International conference on solid-state and integrated circuit technology; Beijing, 1998; Oct, 1998, 753-756 -- IEEE Press; Publishing House of Electronics Industry; 1998 (pages 753-756) -- 1998

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  1. Hara, T.
  2. Tu, K. M.
  3. Zhang, M

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