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I314 Characterization of Film Quality of Silicon Oxide Films by Remote Plasma CVD using Silent Discharge from Tetraethylorthosilicate

Ishimaru, K.; Miwa, Y.; Okazaki, K.

Nihon Dennetsu Shimpojiumu koen rombunshu.; National heat transfer symposium of Japan; Kobe, Japan, 2000; May, 2000, 965-966 -- Japan Heat Transfer Society; 2000 Part: 3; (pages 965-966) -- 2000

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Effect of Depressurizing on CVD of Silicon Oxide Films Using Remote Plasma by Silent Discharge

Ishimaru, K. Okazaki, K.

Nihon Dennetsu Shimpojiumu koen rombunshu.; Heat Transfer Society of Japan; Saitama, Japan, 2001; May, 2001, 115-116 -- Heat Transfer Society of Japan; 2001 Part: 1; (pages 115-116) -- 2001

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CVD Characteristics of Silicon Oxide Films by Nonequilibrium Plasma Chemical Reactions Using Pulsed Silent Discharge

Ishimaru, K.; Okazaki, K.

Nihon Dennetsu Shimpojiumu koen rombunshu.; National heat transfer symposium of Japan; Nagoya; Japan, 1998; May, 1998, 653-654 -- Japan Heat Transfer Society; 1998 (pages 653-654) -- 1998

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Application of Nonequilibrium Plasma Chemical Reactions Using Pulsed Silent Discharge to CVD of Silicon Oxide Films

Ishimaru, K.; Okazaki, K.

Nihon Dennetsu Shimpojiumu koen rombunshu.; Heat transfer; Sendai; Japan, 1997; May, 1997, 397-398 -- JHTS; 1997 Part: Part 2; (pages 397-398) -- 1997

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  1. Okazaki, K  (3)
  2. Ishimaru, K.  (3)
  3. Miwa, Y.  (1)
  4. Ishimaru, K. Okazaki, K.  (1)
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  1. Okazaki, K
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