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10 results  for Everything in this catalogue

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1
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Article
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Mask damage by electrostatic discharge: a reticle printability evaluation [4691-147]

Rudack, A. C. Levit, L. B. Williams, A. M.; Yen, A.

Proceedings of SPIE, the International Society for Optical Engineering.; Optical microlithography; Santa Clara, CA, 2002; Mar, 2002, 1340-1347 -- SPIE; 2002 (pages 1340-1347) -- 2002

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2
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Article
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Mask damage by electrostatic discharge: a reticle printability evaluation [4691-147]

Rudack, A. C. Levit, L. B. Williams, A. M.; Yen, A.

International Society for Optical Engineering; 1999 Part: 2; (pages 1340-1347) -- 2002

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3
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Article
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Mask damage by electrostatic discharge: a reticle printability evaluation [4691-147]

Rudack, A. C. Levit, L. B. Williams, A. M.; Yen, A.

International Society for Optical Engineering; 1999 Part: 1; (pages 1340-1347) -- 2002

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4
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Article
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Effect of phase error on 180-nm and 250-nm grouped-line KrF lithography using an alternating phase-shift mask [3096-45]

Petersen, J. S. et al.

Proceedings of SPIE, the International Society for Optical Engineering.; Photomask and x-ray mask technology; Kawasaki; Japan, 1997; Apr, 1997, 375-382 -- SPIE; 1997 Part: Part 3096; (pages 375-382) -- 1997

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5
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Article
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Effect of phase error on 180-nm and 250 nm grouped-line KrF lithoraphy using an alternating pahse-shift mask [3096-45]

Petersen, J. S. et al.

SPIE INTERNATIONAL SOCIETY FOR OPTICAL Part: Part 3096; (pages 375-382) -- 1997

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6
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Article
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Comparison of binary mask defect printability analysis using virtual stepper system and aerial image microscope system [3873-112]

Phan, K. A. et al.

International Society for Optical Engineering; 1999 (pages 681-693) -- 1999

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7
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Article
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Characterization of a projection lens using the extended Nijboer-Zernike approach [4691-154]

Dirksen, P. Braat, J. J. De Bisschop, P. Janssen, A. J. E. M.; Juffermans, C. A. Williams, A. M.; Yen, A.

International Society for Optical Engineering; 1999 Part: 1; (pages 1392-1399) -- 2002

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8
Material Type:
Article
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Characterization of a projection lens using the extended Nijboer-Zernike approach [4691-154]

Dirksen, P. Braat, J. J. De Bisschop, P. Janssen, A. J. E. M.; Juffermans, C. A. Williams, A. M.; Yen, A.

International Society for Optical Engineering; 1999 Part: 2; (pages 1392-1399) -- 2002

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9
Material Type:
Article
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Characterization of a projection lens using the extended Nijboer-Zernike approach [4691-154]

Dirksen, P. Braat, J. J. De Bisschop, P. Janssen, A. J. E. M.; Juffermans, C. A. Williams, A. M.; Yen, A.

Proceedings of SPIE, the International Society for Optical Engineering.; Optical microlithography; Santa Clara, CA, 2002; Mar, 2002, 1392-1399 -- SPIE; 2002 (pages 1392-1399) -- 2002

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10
Material Type:
Article
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Comparison of binary mask defect printability analysis using virtual stepper system and aerial image microscope system [3873-112]

Phan, K. A. et al.

Proceedings of SPIE, the International Society for Optical Engineering.; Photomask technology; Monterey, CA, 1999; Sep, 1999, 681-693 (pages 681-693) -- 1999

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10 results  for Everything in this catalogue

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