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Organometallic chemical vapor deposition of compound semiconductors

Grassi, M. et al.

Materials science and engineering. B, Solid-state materials for advanced technology.; Brazilian Society for Materials Research; Brazilian MRS 2003, symposium A current trends in nanostructured materials and systems II; Rio de Janeiro, 2003; Oct, 2004, 179-181 -- Elsevier,; 2004 (pages 179-181) -- 2004

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Obtention of selective membranes for water and hydrophobic liquids by plasma enhanced chemical vapor deposition on porous substrates

Bankovic, P. et al.

Materials science and engineering. B, Solid-state materials for advanced technology.; Brazilian Society for Materials Research; Brazilian MRS 2003, symposium A current trends in nanostructured materials and systems II; Rio de Janeiro, 2003; Oct, 2004, 165-170 -- Elsevier,; 2004 (pages 165-170) -- 2004

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Production and characterization of hydrogenated amorphous carbon thin films deposited in methane plasmas diluted by noble gases

Capote, G. et al.

Materials science and engineering. B, Solid-state materials for advanced technology.; Brazilian Society for Materials Research; Brazilian MRS 2003, symposium A current trends in nanostructured materials and systems II; Rio de Janeiro, 2003; Oct, 2004, 101-105 -- Elsevier,; 2004 (pages 101-105) -- 2004

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Thermal stability of Hf-based high-k dielectric films on silicon for advanced CMOS devices

Bastos, K. P. et al.

Materials science and engineering. B, Solid-state materials for advanced technology.; Brazilian Society for Materials Research; Brazilian MRS 2003, symposium A current trends in nanostructured materials and systems II; Rio de Janeiro, 2003; Oct, 2004, 134-138 -- Elsevier,; 2004 (pages 134-138) -- 2004

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Carbon nanotubes growth by chemical vapor deposition using thin film nickel catalyst

Moshkalyov, S. A. et al.

Materials science and engineering. B, Solid-state materials for advanced technology.; Brazilian Society for Materials Research; Brazilian MRS 2003, symposium A current trends in nanostructured materials and systems II; Rio de Janeiro, 2003; Oct, 2004, 147-153 -- Elsevier,; 2004 (pages 147-153) -- 2004

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Structural and electrical properties of low-temperature PECVD SiC/c-Si heterostructures

Oliveira, A. R. et al.

Materials science and engineering. B, Solid-state materials for advanced technology.; Brazilian Society for Materials Research; Brazilian MRS 2003, symposium A current trends in nanostructured materials and systems II; Rio de Janeiro, 2003; Oct, 2004, 144-146 -- Elsevier,; 2004 (pages 144-146) -- 2004

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Spectroscopic characteristics of doped nanoporous aluminum oxide

de Azevedo, W. M. et al.

Materials science and engineering. B, Solid-state materials for advanced technology.; Brazilian Society for Materials Research; Brazilian MRS 2003, symposium A current trends in nanostructured materials and systems II; Rio de Janeiro, 2003; Oct, 2004, 171-174 -- Elsevier,; 2004 (pages 171-174) -- 2004

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Nanoparticles-based chemical gas sensors for outdoor air quality monitoring microstations

Baraton, M.-I. et al.

Materials science and engineering. B, Solid-state materials for advanced technology.; Brazilian Society for Materials Research; Brazilian MRS 2003, symposium A current trends in nanostructured materials and systems II; Rio de Janeiro, 2003; Oct, 2004, 206-213 -- Elsevier,; 2004 (pages 206-213) -- 2004

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Structural analysis of silicon oxynitride films deposited by PECVD

Criado, D. et al.

Materials science and engineering. B, Solid-state materials for advanced technology.; Brazilian Society for Materials Research; Brazilian MRS 2003, symposium A current trends in nanostructured materials and systems II; Rio de Janeiro, 2003; Oct, 2004, 123-127 -- Elsevier,; 2004 (pages 123-127) -- 2004

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Photocurrent and photoluminescence studies of resonant tunneling diodes

dos Santos, L. F. et al.

Materials science and engineering. B, Solid-state materials for advanced technology.; Brazilian Society for Materials Research; Brazilian MRS 2003, symposium A current trends in nanostructured materials and systems II; Rio de Janeiro, 2003; Oct, 2004, 131-133 -- Elsevier,; 2004 (pages 131-133) -- 2004

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by this Author/Contributor:

  1. Hangleiter, A.
  2. Camassel, J.
  3. Hirtz, J.-P.
  4. Krozer, V.
  5. Fricke, K

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