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Dry etching properties of methyl-BCN film with C4F8 gas for Cu/low-k interconnection

Aoki, H. et al.

Diamond and related materials. VOL 19; NUMBER 5-6, ; 2010, 507-509 -- Elsevier Science B.V., Amsterdam. (pages 507-509) -- 2010

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Influence of oxygen plasma treatment on properties of Methyl-BCN film

Lu, Z. et al.

Diamond and related materials. VOL 20; NUMBER 4, ; 2011, 609-612 -- Elsevier Science B.V., Amsterdam. -- 2011

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Influence of the methyl group on the dielectric constant of boron carbon nitride films containing it

Aoki, H. et al.

Diamond and related materials. VOL 19; NUMBER 12, ; 2010, 1437-1440 -- Elsevier Science B.V., Amsterdam. Part: Part 12; (pages 1437-1440) -- 2010

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Synthesis of methyl boron nitride film as low-k insulating film for LSI interconnection

Aoki, H. et al.

Diamond and related materials. VOL 18; NUMBER 5-8, ; 2009, 1048-1051 -- Elsevier Science B.V., Amsterdam. Part 5-8; (pages 1048-1051) -- 2009

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Properties of boron carbon nitride (BCN) film after plasma ashing

Mazumder, M. K. et al.

Diamond and related materials. VOL 18; NUMBER 2-3, ; 2009, 419-422 -- Elsevier Science B.V., Amsterdam. (pages 419-422) -- 2009

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  1. Mazumder, M. K.  (2)
  2. Watanabe, D.  (2)
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by this Author/Contributor:

  1. Masuzumi, T.
  2. Hara, M
  3. Sugino, T
  4. Aoki, H.
  5. Kimura, C.

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