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Influence of activation energy on LER in chemically amplified KrF photoresists [5376-100]

Kim, J. H. et al.

Proceedings of SPIE, the International Society for Optical Engineering.; Advances in resist technology and processing; Santa Clara, Calif., 2004; Feb, 2004, 790-800 -- SPIE; c2004 (pages 790-800) -- 2004

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Influence of activation energy on LER in chemically amplified KrF photoresists [5376-100]

Kim, J. H. et al.

Proceedings of SPIE, the International Society for Optical Engineering. VOL 5376; PART 2, ; 2004, 790-800 -- International Society for Optical Engineering; 1999 (pages 790-800) -- 2004

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by this Author/Contributor:

  1. Kim, Y. H.
  2. Kim, K. M.
  3. Lee, S. Y.
  4. Park, S. B.
  5. Kim, W. M.

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