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I314 Characterization of Film Quality of Silicon Oxide Films by Remote Plasma CVD using Silent Discharge from Tetraethylorthosilicate

Ishimaru, K.; Miwa, Y.; Okazaki, K.

Nihon Dennetsu Shimpojiumu koen rombunshu.; National heat transfer symposium of Japan; Kobe, Japan, 2000; May, 2000, 965-966 -- Japan Heat Transfer Society; 2000 Part: 3; (pages 965-966) -- 2000

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CVD Characteristics of Silicon Oxide Films by Nonequilibrium Plasma Chemical Reactions Using Pulsed Silent Discharge

Ishimaru, K.; Okazaki, K.

Nihon Dennetsu Shimpojiumu koen rombunshu.; National heat transfer symposium of Japan; Nagoya; Japan, 1998; May, 1998, 653-654 -- Japan Heat Transfer Society; 1998 (pages 653-654) -- 1998

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Application of Nonequilibrium Plasma Chemical Reactions Using Pulsed Silent Discharge to CVD of Silicon Oxide Films

Ishimaru, K.; Okazaki, K.

Nihon Dennetsu Shimpojiumu koen rombunshu.; Heat transfer; Sendai; Japan, 1997; May, 1997, 397-398 -- JHTS; 1997 Part: Part 2; (pages 397-398) -- 1997

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3 results  for Everything in this catalogue

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by this Author/Contributor:

  1. Okazaki, K
  2. Ishimaru, K.
  3. Miwa, Y.

on this subject:

  1. Heat transfer
  2. JHTS

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