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New ArF resist introduction for process through-put enhancement [6519-141]

Kim, M.-S. et al.

Proceedings of SPIE, the International Society for Optical Engineering. VOL 6519; PART 2, ; 2007, 65193G -- International Society for Optical Engineering; 1999 -- 2007

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The study of defect control and patterning performance for top coating free resist process [6923-69]

Kim, M.-S. et al.

Proceedings of SPIE, the International Society for Optical Engineering. VOL 6923; PART 1, ; 2008, 6923 1T -- International Society for Optical Engineering; 1999 -- 2008

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  1. Park, S.-N.  (1)
  2. Henderson, C.L.  (1)
  3. Shim, K.-C.  (1)
  4. Lin, Q.  (1)
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by this Author/Contributor:

  1. Kang, H.-S.
  2. Lee, H.-G.
  3. Kim, H. J.
  4. Gil, M. G.
  5. Kim, M.‐S.

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