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Channel mobility degradation and charge trapping in high-k/metal gate NMOSFETs

Mathew, S. et al.

Thin solid films.; International conference on materials for advanced technologies; ICMAT 2003; Singapore, 2003; Dec, 2004, 11-14 -- Elsevier,; 2004 (pages 11-14) -- 2004

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Wet etching characteristics and surface morphology evaluation of MOCVD grown HfO~2 film

Balasubramanian, M. et al.

Thin solid films.; International conference on materials for advanced technologies; ICMAT 2003; Singapore, 2003; Dec, 2004, 101-105 -- Elsevier,; 2004 (pages 101-105) -- 2004

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Effect of annealing on the composition and structure of HfO~2 and nitrogen-incorporated HfO~2

Yeo, C. C. et al.

Thin solid films.; International conference on materials for advanced technologies; ICMAT 2003; Singapore, 2003; Dec, 2004, 90-95 -- Elsevier,; 2004 (pages 90-95) -- 2004

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Feasibility study of using thin aluminum nitride film as a buffer layer for dual metal gate process

Park, C. S. et al.

Thin solid films.; International conference on materials for advanced technologies; ICMAT 2003; Singapore, 2003; Dec, 2004, 15-18 -- Elsevier,; 2004 (pages 15-18) -- 2004

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Electrical evaluation of laser annealed junctions by Hall measurements

Poon, C. H. et al.

Thin solid films.; International conference on materials for advanced technologies; ICMAT 2003; Singapore, 2003; Dec, 2004, 72-75 -- Elsevier,; 2004 (pages 72-75) -- 2004

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5 results  for Everything in this catalogue

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  1. Joo, M. S.  (3)
  2. Bera, L. K.  (2)
  3. Mathew, S  (2)
  4. Kwong, D.-L.  (1)
  5. Lim, V.  (1)
  6. Park, C.-S.  (1)
  7. Tan, L.-S.  (1)
  8. Balasubramanian, M  (1)
  9. Yeo, C. C.  (1)
  10. Chan, L.  (1)
  11. Poon, C. H.  (1)
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by this Author/Contributor:

  1. Mhaisalkar, S. G.
  2. Balasubramanian, N.
  3. Cho, B. J.
  4. Zhang, D.-H.
  5. Joo, M. S.

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