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Comparison of binary mask defect printability analysis using virtual stepper system and aerial image microscope system [3873-112]
Comparison of binary mask defect printability analysis using virtual stepper system and aerial image microscope system [3873-112]
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Comparison of binary mask defect printability analysis using virtual stepper system and aerial image microscope system [3873-112]

Phan, K. A. et al.

International Society for Optical Engineering; 1999 (pages 681-693) -- 1999

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Comparison of binary mask defect printability analysis using virtual stepper system and aerial image microscope system [3873-112]
Comparison of binary mask defect printability analysis using virtual stepper system and aerial image microscope system [3873-112]
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Comparison of binary mask defect printability analysis using virtual stepper system and aerial image microscope system [3873-112]

Phan, K. A. et al.

Proceedings of SPIE, the International Society for Optical Engineering.; Photomask technology; Monterey, CA, 1999; Sep, 1999, 681-693 (pages 681-693) -- 1999

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  1. Abboud, F. E.  (1)
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by this Author/Contributor:

  1. Bala, V.
  2. Phan, K. A.
  3. Williams, A. M.
  4. Karklin, L.
  5. Eandi, R. D.

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  2. Photomask technology
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