skip to main content
Show Results with:

2 results  for Everything in this catalogue

Refined by: genre: Conference literature remove creation date: 2000To2001 remove
Result Number Material Type Add to My Shelf Action Record Details and Options
1
Material Type:
Article
Add to My workspace

I314 Characterization of Film Quality of Silicon Oxide Films by Remote Plasma CVD using Silent Discharge from Tetraethylorthosilicate

Ishimaru, K.; Miwa, Y.; Okazaki, K.

Nihon Dennetsu Shimpojiumu koen rombunshu.; National heat transfer symposium of Japan; Kobe, Japan, 2000; May, 2000, 965-966 -- Japan Heat Transfer Society; 2000 Part: 3; (pages 965-966) -- 2000

Check library holdings

2
Material Type:
Article
Add to My workspace

Effect of Depressurizing on CVD of Silicon Oxide Films Using Remote Plasma by Silent Discharge

Ishimaru, K. Okazaki, K.

Nihon Dennetsu Shimpojiumu koen rombunshu.; Heat Transfer Society of Japan; Saitama, Japan, 2001; May, 2001, 115-116 -- Heat Transfer Society of Japan; 2001 Part: 1; (pages 115-116) -- 2001

Check library holdings

2 results  for Everything in this catalogue

Refine Search Results

Refine my results

Author/Contributor 

  1. Okazaki, K.  (1)
  2. Miwa, Y.  (1)
  3. Ishimaru, K.  (1)
  4. Ishimaru, K. Okazaki, K.  (1)
  5. Refine further open sub menu

Creation date 

From To

Try a new search

Ignore my search and look for everything

by this Author/Contributor:

  1. Okazaki, K.
  2. Miwa, Y.
  3. Ishimaru, K.
  4. Ishimaru, K. Okazaki, K.

on this subject:

  1. Heat transfer

Searching Remote Databases, Please Wait