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10:15 C-7-4L Low Resistance Ni Thin Film Deposition for Nickel Silicide by Atomic Layer Deposition

Do, K. W. et al.

SOLID STATE DEVICES AND MATERIALS.; Solid state devices and materials; Kobe, Japan, 2005; Sep, 2005, 898-899 -- Japan Society of Applied Physics; 2005 (pages 898-899) -- 2005

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