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Comparison of two-dimensional and three-dimensional models for profile simulation of poly-Si etching of finite length trenches

Hoekstra Mark, R. J.; Kushner, J.

Journal of vacuum science & technology. A, Vacuum, surfaces, and films. VOL 16; NUMBER 6, ; 1998, 3274-3280 -- SLACK INCORPORATED Part: Part 6; (pages 3274-3280) -- 1998

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