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Changes in chemical behavior of thin film lead zirconate titanate during Ar+-ion bombardment using XPS

Kim, J. N. Shin, K. S. Kim, D. H. Park, B. O. Kim, N. K. Cho, S. H.

Applied surface science. VOL 206; NUMBER 1-4, ; 2003, 119-128 -- Elsevier Science B.V., Amsterdam. (pages 119-128) -- 2003

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  • Title:
    Changes in chemical behavior of thin film lead zirconate titanate during Ar+-ion bombardment using XPS
  • Author: Kim, J. N. Shin, K. S. Kim, D. H. Park, B. O. Kim, N. K. Cho, S. H.
  • Found In: Applied surface science. VOL 206; NUMBER 1-4, ; 2003, 119-128
  • Journal Title: Applied surface science.
  • Subjects: Electrical and Electronic Engineering; Mechanical Engineering; Civil Engineering; LCC: TA418.7; Dewey: 621.35
  • Publication Details: Elsevier Science B.V., Amsterdam.
  • Language: English
  • Abstract: Thin film lead zirconate titanate (PZT) was grown on Pt/TiO2/SiO2/Si substrates using direct liquid injection metal organic chemical vapor deposition (DLI-MOCVD). The chemical states and stoichiometry was characterized by employing X-ray photoelectron spectroscopy (XPS). The discussion was focused on the chemical change during in-depth profile by Ar+-ion bombardment. In addition, relative atomic sensitivity factors (ASFs) were corrected to determine practically more accurate chemical compositions in the thin film PZT. And then, the chemical compositions by their application to quantification were compared with other data using the data base of Wagner ASFs and Scofield ASFs.
  • Identifier: Journal ISSN: 0169-4332
  • Publication Date: 2003
  • Physical Description: Electronic
  • Accrual Information: Weekly
  • Shelfmark(s): 1580.082000
  • UIN: ETOCRN125213157

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