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Robust Ternary Metal Gate Electrodes for Dual Gate CMOS Devices

Park, D.-G. Cha, T.-H. Lim, K.-Y. Cho, H.-J. Kim, T.-K. Jang, S.-A. Suh, Y.-S. Misra, V. Yeo, I.-S. Roh, J.-S.

Technical digest / International Electron Devices Meeting.; International electron devices meeting; Washington, DC, 2001; Dec, 0, 671-676 -- IEEE; 2001 (pages 671-676)

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